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Memory Effects In Hybrid Silicon-metallic Nanoparticle-organic Thin Film Structures

M. Mabrook, C. Pearson, D. Kolb, D. Zeze, M. Petty
Published 2008 ·

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Abstract We report on the electrical behaviour of metal–insulator–semiconductor (MIS) structures fabricated on silicon substrates and using organic thin films as the dielectric layers. These insulating thin films were produced by different methods, including spin-coating (polymethylmethacrylate), thermal evaporation (pentacene) and Langmuir–Blodgett deposition (cadmium arachidate). Gold nanoparticles, deposited at room temperature by chemical self-assembly, were used as charge storage elements. In all cases, the MIS devices containing the nanoparticles exhibited hysteresis in their capacitance versus voltage characteristics, with a memory window depending on the range of the voltage sweep. This hysteresis was attributed to the charging and discharging of the nanoparticles from the gate electrode. A maximum memory window of 2.5 V was achieved by scanning the applied voltage of an Al/pentacene/Au nanoparticle/SiO 2 /p-Si structure between 9 and −9 V.
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