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An Anthracene-containing PMMA Derivative For Photoresist And Channel Waveguide Applications

Stefan Paul, O. Halle, Heiko Einsiedel, B. Menges, K. Müllen, W. Knoll, S. Mittler-Neher
Published 1996 · Materials Science

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Abstract We study the possibilities for photopatterning a polymethylmethacrylate derivative carrying an anthracene group in the side chain. This material allows the preparation of high quality optical films by spin coating. Upon irradiation of these films with UV light changes in the optical constants, refractive index and absorption, and the degree of solubility can be induced by photocrosslinking and endoperoxide formation. These features qualify this polymer as a promising material for both integrated optics and photolithography or a combination of both.
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