Online citations, reference lists, and bibliographies.
Please confirm you are human
(Sign Up for free to never see this)
← Back to Search

A Monte Carlo Simulation Of The Physical Vapor Deposition Of Nickel

Y. Yang, R. Johnson, H. Wadley
Published 1997 · Materials Science

Save to my Library
Download PDF
Analyze on Scholarcy
Share
Abstract A two-step Monte Carlo method for atomistically simulating low energy physical vapor deposition processes is developed and used to model the two-dimensional physical vapor deposition of nickel. The method consists of an impact approximation for the initial adatom adsorption on a surface and a multipath diffusion analysis to simulate subsequent surface morphology and interior atomic structure evolution. An embedded atom method is used to determine the activation energies for each of the many available diffusional paths. The method has been used to predict the morphology/structure evolution of nickel films over the length and time scales encountered in practical deposition processes. The modeling approach has enabled determination of the effect of vapor processing variables such as flux orientation, deposition rate and substrate temperature on deposit morphology/microstructure as defined by packing density, surface roughness and growth column width (which appears closely related to grain size). Several aspects of the empirical Movchan-Demchishin structure zone model are well predicted by this approach.
This paper references
10.1016/0001-6160(84)90150-0
The development of grain structure during growth of metallic films
C. Grovenor (1984)
10.1016/0040-6090(95)06573-3
Directional and preferential sputtering-based physical vapor deposition
S. M. Rossnagel (1995)
Thin Film Phenomenu
J. A. Thornton (1977)
Z. Phl;s. Chem
M Volmer (1926)
10.1103/PHYSREVLETT.72.112
Observation of a growth instability during low temperature molecular beam epitaxy.
Ernst (1994)
10.1016/0040-6090(89)90103-X
Structural evolution in continuous-variation-of-incidence thin films: A computer simulation
J.-S. Gau (1989)
Thin Film Phenomenu
J. A. Thornton (1977)
Phys. Rev. A34
P Meakin (1986)
10.1063/1.1657442
Step Motion on Crystal Surfaces. II
R. Schwoebel (1966)
Thin Film Phenomenu
K L Chopra (1969)
J. Vat. Sci. Technol
S D Dahlgren (1974)
Phys. Rev. B39
R A Johnson (1989)
10.1016/0040-6090(72)90276-3
Effect of vapour incidence angles on profile and properties of condensed films
N. G. Nakhodkin (1972)
10.1016/b978-0-444-88908-9.50001-2
Handbook of Crystal Growth
P. Phillips (1993)
10.1524/zpch.1996.193.Part_1_2.218a
Fractal Concepts in Surface Growth
G. Vojta (1996)
10.1149/1.2407581
Thin Film Phenomena
K. Chopra (1969)
Brr. Akad. Wits. Wien
J N Stranski (1938)
Modeling und Simulation of Thin-Film Processing 389
C C Fang
J. Vat. Sci. Technol
J F Butler (1970)
10.1063/1.111004
Large scale surface structure formed during GaAs (001) homoepitaxy
C. Orme (1994)
Phys. Lett
(1974)
10.1557/JMR.1989.1195
Analytic embedded atom method model for bcc metals
R. Johnson (1989)
Radiation Effects and D#cts
G. H. Gilmer (1994)
J. Mater. Res
R A Johnson (1989)
J. Electrochem. Sot
J F Groves (1995)
Appl. Phys. Lett
A M Glasper (1991)
J. Appl. Phys
K H Mtiller (1985)
10.1063/1.335639
Geometry of thin‐film morphology
R. Messier (1985)
10.1116/1.1312724
Structure/property relationships in evaporated thick films and bulk coatings
R. Bunshah (1974)
Nakhodkin and A. 1. Shaldervan
(1972)
J. Appl. Phys
R Messier (1985)
IEEE Transactions on Electron Devices
S K Dew (1992)
Phys. Rev. Lett
L M Sudijono (1994)
Phys. Rev. B37 Philos. Mag. A
R A Johnson (1984)
Phys. Rev. Lett
M A Cotta (1993)
Phys. Rev. B29
M S Daw (1984)
F . Bunshah , J . Var . Sci . Technol . 11 , 633 ( 1974 ) . J . F . Butler . J . Vat
B. L. Halpern
J. Appl. Phys
C C Fang (1993)
Composites. Engr
J F Groves
J. Vu. Sci. Technol. A3
K H Miiller (1985)
Radiation Effects and D#cts in Solicis 13&131
G H Gilmer (1994)
10.1007/BF02652132
Computer simulation of microstructural evolution in thin films
H. J. Frost (1988)
10.1016/0022-3115(94)90015-9
Atomic-level computer simulation
J. Adams (1994)
Metal Finishing 12
B L Halpern (1992)
J. Cryst. Growth
G W Smith (1993)
Lankey, composites. Engr
H N G Wadley (1995)
Scripta Metall. et Mater
L M Hsiung (1993)
Handbook qf Deposition Technologies for Films and Coatings
B L Halpern (1994)
Phys. Met. Metallogr
B A Movchan (1969)
10.1080/14786441908652116
XXVI. Account of experiments made on the strength of materials. In a Letter to Thomas Young, M.D. For. Sec. R.S. With Notes by Mr. T. Tredgold
George Rennie jun. Esq. (1819)
10.1146/ANNUREV.MS.07.080177.001323
High Rate Thick Film Growth
J. Thornton (1977)
J. Nuclear Materials
J B Adams (1994)
J. Vat. Sci. Technol
E Chason (1991)
10.1109/16.141224
Simulation of elevated temperature aluminum metallization using SIMBAD
S. K. Dew (1992)
Handbook of deposition technologies for films and coatings
R. Bunshah (1994)
10.1063/1.1655341
Simulation of structural anisotropy and void formation in amorphous thin films
D. W. Henderson (1974)
10.1016/0040-6090(92)90640-W
Columnar microstructures in magnetron-sputtered refractory metal thin films of tungsten, molybdenum and W-Ti-(N)
A. Dirks (1992)
10.1016/0022-0248(93)90769-S
Real-time laser-light scattering studies of surface topography development during GaAs MBE growth
G. Smith (1993)
10.1063/1.354363
Effect of gas impurity and ion bombardment on stresses in sputter-deposited thin films: A molecular-dynamics approach
C. C. Fang (1993)
J. Var. Sci. Technol
R F Bunshah (1974)
Computer Simulation of Microstructural Evolution (edited by David J. Srolovitz)
G S M P Crest (1986)
10.1016/0040-6090(92)90489-X
A two-dimensional Monte Carlo model for thin film growth by oblique evaporation: simulation of two-component systems for the example of Co-Cr
S. Müller‐Pfeiffer (1992)
10.1063/1.105706
Surface topography changes during the growth of GaAs by molecular beam epitaxy
G. Smith (1991)
10.1063/1.335885
Dependence of thin‐film microstructure on deposition rate by means of a computer simulation
K. Müller (1985)
H
Book Company (1969)
J. Metals
Y Shigesato (1995)
J. Chem. Phys
R D Young (1965)
Appl. Phys. Lett
C Orme (1994)
10.1016/0040-6090(77)90355-8
Computer simulation of amorphous thin films of hard spheres
S. Kim (1977)
10.1149/1.2129974
Current Topics in Materials Science
E. Kaldis (1980)
10.1116/1.1312763
Columnar grains and twins in high-purity sputter-deposited copper
S. Dahlgren (1974)
Mater. Sci. and Engr. B6
G H Gilmer (1990)
10.1063/1.339559
Stress and microstructure of sputter‐deposited thin films: Molecular dynamics investigations
K. Müller (1987)
Proc. Rev. Sot. A198
F C Frank (1949)
10.1103/PHYSREVLETT.70.4106
Kinetic surface roughening in molecular beam epitaxy of InP.
Cotta (1993)
10.1103/PHYSREVLETT.72.116
Stable and unstable growth in molecular beam epitaxy.
Johnson (1994)
J. Appl. Phys
K H Miiller (1987)
10.1524/ZKRI.1958.110.1-6.372
Phänomenologische Theorie der Kristallabscheidung an Oberflächen. I
E. Bauer (1958)
Applied Su@zce Science
Y Sasajima (1992)
J. Appl. Phys
R L Schwoebel (1966)
Ann. Rec. Mater. Sci
J A Thornton (1977)
unpublished work
J. Vat. Sci. Technol
R W Vook (1965)
Phys. Rev. B36
M Schneider (1987)
Phys. Rev. Lett
H J Ernst (1994)
10.1063/1.1695865
Condensation of Tungsten on Tungsten in Atomic Detail: Monte Carlo and Statistical Calculations vs Experiment
R. D. Young (1965)
10.1016/0168-583x(92)95409-k
Computer simulation of ion-solid interactions
W. Eckstein (1991)



This paper is referenced by
10.1115/1.4031461
Controlled Kinetic Monte Carlo Simulation for Computer-Aided Nanomanufacturing
Y. Wang (2016)
10.1109/ICIA.2004.1373420
A novel MC algorithm and its application
J. Zheng (2004)
10.1063/1.1579112
Microstructure of thin tantalum films sputtered onto inclined substrates: Experiments and atomistic simulations
J. Torre (2003)
10.1103/PHYSREVE.78.031601
Kinetic Monte Carlo study on the decay of two-dimensional nanostructures: influence of the activation energy of diffusion on kinetic and morphological properties.
M. F. Castez (2008)
10.1016/S1359-6454(01)00287-7
Atomic scale structure of sputtered metal multilayers
X. Zhou (2001)
10.1063/1.5085313
Kinetic Monte Carlo simulations of stress and morphology evolution in polycrystalline thin films
E. Chason (2019)
10.1557/PROC-671-O4.1
Atomic Assembly of Giant Magnetoresistive Multilayers
H. Wadley (2001)
10.1109/CDC.2010.5717649
Simultaneous regulation of thin film surface mean slope and roughness for light trapping optimization using predictive control
X. Zhang (2010)
10.1063/1.368297
Atomistic simulations of the vapor deposition of Ni/Cu/Ni multilayers: The effects of adatom incident energy
X. Zhou (1998)
10.4028/www.scientific.net/KEM.336-338.2238
Surface Morphology of Thin Film Deposited on Rotating Substrate by EB-PVD
Y. Shan (2007)
10.1088/0022-3727/38/23/010
Kinetic Monte Carlo simulation of deposition of energetic copper atoms on a Cu(001) substrate
Z. Liu (2005)
10.1109/ACC.2013.6580067
Porosity control in thin film solar cells: Two-dimensional case
Jianqiao Huang (2013)
10.1201/B10382-17
Multiscale Modeling and Control of Porous Thin Film Growth
G. Hu (2010)
10.1146/ANNUREV.MATSCI.32.012102.110247
Kinetic Monte Carlo Simulation of Chemical Vapor Deposition
C. Battaile (2002)
10.1116/1.4927162
Microstructure of vapor deposited coatings on curved substrates
Theron M. Rodgers (2015)
10.1080/14786430310001623579
Misfit dislocations in gold/Permalloy multilayers
X. Zhou (2004)
10.1088/0953-8984/21/26/263001
Continuous and discrete modeling of the decay of two-dimensional nanostructures.
M. F. Castez (2009)
10.1016/S1359-6454(96)00283-2
A MOLECULAR DYNAMICS STUDY OF NICKEL VAPOR DEPOSITION: TEMPERATURE, INCIDENT ANGLE, AND ADATOM ENERGY EFFECTS
Xiaowang Zhou (1997)
10.1007/S10934-008-9261-4
Pore evolution during high pressure atomic vapor deposition
D. Hass (2010)
10.2320/MATERTRANS.42.439
A Monte Carlo Simulation on the Process of Cluster Deposition
Kenta Hongo (2001)
10.1016/S0040-6090(99)01057-3
Lattice Monte Carlo models of thin film deposition
G. Gilmer (2000)
10.1016/S1359-6454(98)00403-0
Twin formation during the atomic deposition of copper
X. Zhou (1999)
Sputter deposition of Iridium and Iridium Oxide for stimulation electrode coatings
B. Wessling (2007)
10.3182/20090712-4-TR-2008.00151
Simultaneous Regulation of Surface Roughness and Porosity in Thin Film Growth
G. Hu (2009)
10.1021/IE100012W
Dynamics and Lattice-Size Dependence of Surface Mean Slope in Thin-Film Deposition
Jianqiao Huang (2011)
Modeling and Control of Thin Film Surface Morphology: Application to Thin Film Solar Cells
Jianqiao Huang (2012)
10.1109/NAP.2017.8190193
Gas sensor device creation
S. Nagirnyak (2017)
10.1557/JMR.2001.0143
Synthesis of open-cell metal foams by templated directed vapor deposition
D. T. Queheillalt (2001)
10.1016/J.PMATSCI.2015.06.003
Perspectives on oblique angle deposition of thin films: From fundamentals to devices
A. Barranco (2016)
10.1016/J.CES.2011.08.020
Dynamics and control of aggregate thin film surface morphology for improved light trapping: Implementation on a large-lattice kinetic Monte Carlo model
Jianqiao Huang (2011)
10.1016/J.COMMATSCI.2017.10.052
Physical vapor deposition of multiphase materials with phase nucleation via a coupled phase-field approach
J. A. Stewart (2018)
Phase-Field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films
J. A. Stewart (2016)
See more
Semantic Scholar Logo Some data provided by SemanticScholar