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Self-Assembled Monolayers Of Organosilicon Hydrides Supported On Titanium, Zirconium, And Hafnium Dioxides

Alexander Y. Fadeev, R. Helmy, S. Marcinko
Published 2002 · Chemistry

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This work investigates the preparation of the self-assembled monolayers (SAMs) of organosilicon hydrides (RSiH3) supported on transition metal oxides. The reactions of alkyl-, fluoroalkyl-, and ω-alkenyl-silanes and α,ω-bis-hydridosilanes with nonporous high surface area TiO2 (rutile and anatase), ZrO2 (monoclinic), and HfO2 (monoclinic) powders were studied, and supported SAMs were characterized by Fourier transform infrared (FTIR) spectroscopy, thermogravimetric analysis (TGA), and chemical analysis. SAMs of organosilicon hydrides were closely packed and well-ordered (assessed from CH2 stretchings). Grafting densities of the monolayers were ∼4.6−4.8 group/nm2 for C18H37 SAMs and ∼3.6−3.7 group/nm2 for C6F13 SAMs, which are close to the ultimate values reported in the literature for the best organosilicon SAMs. The reactions with organosilicon hydrides proceed in a noncorrosive environment (no HCl), which distinguishes RSiH3 from RSiCl3 coupling agents. Synthesis of the monolayers was highly reproducible...

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