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Self-Aligned Formation Of Sub 1 Nm Gaps Utilizing Electromigration During Metal Deposition

Yasuhisa Naitoh, Tatsuhiko Ohata, Ryuji Matsushita, Eri Okawa, Masayo Horikawa, Makiko Oyama, Masakazu Mukaida, Dong F. Wang, Manabu Kiguchi, Kazuhito Tsukagoshi, Takao Ishida

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