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Single-step Deposition Of High-mobility Graphene At Reduced Temperatures

D.A. Boyd, W.-H. Lin, C.-C. Hsu, M.L. Teague, C.-C. Chen, Y.-Y. Lo, W.-Y. Chan, W.-B. Su, T.-C. Cheng, C.-S. Chang, C.-I. Wu, N.-C. Yeh

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