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Lithographic Patterning Of Nanoparticle Films Self-assembled From Organic Solutions By Using A Water-soluble Mask
Published 2005 · Physics
A lithographic technique is described that enables the highly selective patterning of thin films from gold nanoparticles and organic linker molecules, which are formed via repetitive self-assembly from organic solution. The key element of this method is the application of a calcium oxide∕hydroxide mask, which withstands the application of organic solvents during film deposition and which prevents deposition of nanoparticles on protected parts of the substrate. After film assembly the mask is removed by dissolution in water at room temperature. The method was used to pattern chemiresistor-type vapor sensors based on gold nanoparticle∕nonanedithiol films. Comparative experiments with nonpatterned reference sensors reveal that the patterning process does not degrade the sensing properties of the films.