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Application Of An Anthracene Containing Polymer To A Negative Type Photoresist

K. Chae, Y. Kim, T. H. Kim
Published 2002 · Chemistry

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Yong Woon Kim, and Taek Hyeon KimFaculty of Applied Chemistry and The Polymer Science & Technology Research Center,Chonnam National University, Gwangju 500-757, KoreaReceived February 19, 2002Key Words : Anthracene polymer, Photoresist, Photo-crosslinkingPhotoresists are very important materials for the photo-fabrication process. They are widely used for the manu-facture of microelectronics, printed circuit boards, silkscreen printing, optical disks, black matrix of color cathod-ray tubes, and so on. They can be classified into two types onthe basis of the solubility changes upon irradiation with UVlight, i.e., positive or negative types. The negative type ofphotoresist is generally more sensitive than the positive one. It is well known that anthracene or its derivatives dimerizephotochemically to give [4+4] cycloadducts across the 9,10-positions of anthracene,
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