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Self-aligned Sub-10-nm Nanogap Electrode Array For Large-scale Integration.
Pingqi Gao, Qing Zhang, H. Li, M. B. Chan-Park
Published 2011 · Materials Science, Medicine
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A novel approach to creating a gap on the nanometer scale between two adjacent electrodes of the same or different metals is described. The gap size can be well controlled through sidewall coverage in a self-aligned manner and it can be tuned from 60 nm down to 5 nm with high reproducibility. This technique is fully compatible with traditional microfabrication technology and it is easily implemented to fabricate a nanogap electrode array for integration purposes. An array of short-channel single-walled carbon nanotube field-effect transistors is demonstrated.
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