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Ultrathin Metal Films On Top Of SAMs

M. Zharnikov
Published 2018 · Materials Science

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The article deals with the problem of fabrication of ultrathin metal films on top of self-assembled monolayers (SAMs), which is of high practical importance in context of molecular and organic electronics where SAMs and their constituents can potentially serve as both ultrathin insulator films and active elements. The fabrication of such metal films is a nontrivial task because of the low sticking coefficients of some metals on organic surfaces and, most important, because of the penetration of the deposited metal atoms into the SAMs, mediated by thermochemical driving forces and defects in the monolayers. In this context, we describe prominent (in our opinion) experimental approaches to avoid these problems, taking Ni as a representative metal adsorbate in few cases and putting particular emphasis on the concept of chemical reactivity of the metal atoms toward the terminal functional groups of the SAMs. The relevant deposition methods and experimental techniques used to monitor the course and outcome of the deposition process are described as well.
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