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A Two Step Process To Form Organothiol Self-assembled Monolayers On Nickel Surfaces

S. Rajalingam, S. Devillers, Joseph Dehalle, Z. Mekhalif
Published 2012 · Materials Science

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This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions.
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