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Nanolithography Of A Full-coverage Octadecylphosphonic Acid Monolayer Spin Coated On A Si Substrate
Published 2007 · Physics
The authors describe a lithographic method based on a scanning probe technique to selectively remove octadecylphosphonic acid (OPA) molecules from their self-assembled monolayers (SAMs) spin coated on a Si substrate. This lithographic technique involves the use of a positively biased probe tip to scan an OPA SAM having a thickness of ∼2nm and provides an opportunity for developing a scanning probe based lithography that accommodates the need for ever-decreasing size of semiconductor devices.