Online citations, reference lists, and bibliographies.
← Back to Search

In Situ Synchrotron Based X-ray Fluorescence And Scattering Measurements During Atomic Layer Deposition: Initial Growth Of HfO2 On Si And Ge Substrates

K. Devloo-Casier, J. Dendooven, K. F. Ludwig, G. Lekens, J. D’Haen, C. Detavernier

Save to my Library
Download PDF
Analyze on Scholarcy