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Electronic Structure Shift Of Deeply Nanoscale Silicon By SiO2 Versus Si3N4 Embedding As An Alternative To Impurity Doping

Dirk König, Noël Wilck, Daniel Hiller, Birger Berghoff, Alexander Meledin, Giovanni Di Santo, Luca Petaccia, Joachim Mayer, Sean Smith, Joachim Knoch

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